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http://hdl.handle.net/11189/3316| Title: | The influence of deposition temperature on vanadium dioxide thin films microstructure and physical properties | Authors: | Msomi, Velaphi Nemraoui, Ouasin |
Keywords: | Deposition temperature;Microstructure;Thermochromism;Thin films;Vanadium dioxide | Issue Date: | 2010 | Publisher: | AOSIS OpenJournals | Source: | Msomi, V. & Nemraoui, O. 92010) The influence of deposition temperature on vanadium dioxide thin films microstructure and physical properties. South African Journal of Science, 106(1/12): 1-4 | Abstract: | Vanadium dioxide thin films were successfully prepared on soda lime glass substrates using the optimised conditions for r.f-inverted cylindrical magnetron sputtering. The optimised deposition parameters were fixed and then a systematic study of the effect of deposition temperature, ranging from 450 °C to 550 °C, on the microstructure of thermochromic thin films was carried out. The deposited films were found to be well crystallised, showing strong texture corresponding to the (011) plane, indicating the presence of vanadium dioxide. | URI: | http://hdl.handle.net/11189/3316 | ISSN: | 0038-2353 | Rights: | http://creativecommons.org/licenses/by-nc-sa/3.0/za/ |
| Appears in Collections: | Eng - Journal articles (DHET subsidised) |
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| File | Description | Size | Format | |
|---|---|---|---|---|
| Msomi_Influence_2010.pdf | Article | 341.78 kB | Adobe PDF | View/Open |
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