Please use this identifier to cite or link to this item: http://hdl.handle.net/11189/3316
DC FieldValueLanguage
dc.contributor.authorMsomi, Velaphi-
dc.contributor.authorNemraoui, Ouasin-
dc.date.accessioned2015-11-02T11:22:37Z-
dc.date.available2015-11-02T11:22:37Z-
dc.date.issued2010-
dc.identifier.citationMsomi, V. & Nemraoui, O. 92010) The influence of deposition temperature on vanadium dioxide thin films microstructure and physical properties. South African Journal of Science, 106(1/12): 1-4en_US
dc.identifier.issn0038-2353-
dc.identifier.urihttp://hdl.handle.net/11189/3316-
dc.description.abstractVanadium dioxide thin films were successfully prepared on soda lime glass substrates using the optimised conditions for r.f-inverted cylindrical magnetron sputtering. The optimised deposition parameters were fixed and then a systematic study of the effect of deposition temperature, ranging from 450 °C to 550 °C, on the microstructure of thermochromic thin films was carried out. The deposited films were found to be well crystallised, showing strong texture corresponding to the (011) plane, indicating the presence of vanadium dioxide.en_US
dc.language.isoenen_US
dc.publisherAOSIS OpenJournalsen_US
dc.rightshttp://creativecommons.org/licenses/by-nc-sa/3.0/za/-
dc.subjectDeposition temperatureen_US
dc.subjectMicrostructureen_US
dc.subjectThermochromismen_US
dc.subjectThin filmsen_US
dc.subjectVanadium dioxideen_US
dc.titleThe influence of deposition temperature on vanadium dioxide thin films microstructure and physical propertiesen_US
dc.type.patentArticleen_US
Appears in Collections:Eng - Journal articles (DHET subsidised)
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